Simulation and Experimental Studies of FTO/WO3 and FTO/WO3/Ag Thin Film Structures for Electrochromic Analysis Deposited by DC RF Magnetron Sputtering

In this work, DC RF magnetron sputtering and COMSOL multiphysics were used to simulate and deposit WO3 and WO3/Ag films, respectively. In the simulation cyclic voltammetry (CV) analysis was examined. The current density for the WO3/Ag films in comparison to the WO3 film was displayed higher. Based on the simulation findings, the experiment was done using DC RF magnetron sputtering to deposit WO3 and WO3/Ag films. Scanning electron microscopy (SEM), X-ray diffraction (XRD), UV–vis spectrometer, and electrochemical analyzer were used to examine the structural, morphological, EC, and optical characteristics of the deposited films. The SEM study revealed a smooth surface for WO3 films and WO3/Ag shows the grain of silver film. The XRD analysis of WO3 films shows the amorphous nature and in WO3/Ag films silver peaks were shown. The bandgap values were found to be 3.14 eV and 3.02 eV for WO3 and WO3/Ag films, respectively. Comparing the WO3/Ag film to the WO3 film, the cyclic voltammograms showed that the WO3/Ag film had the maximum current. In comparison to the WO3 film (30 cm2C−1), higher coloring efficiency values were noted for the WO3/Ag film (48 cm2C−1). For the WO3/Ag film, less time is needed for the coloring (tc = 2.2) and belching (tb = 1.8 s). It was clear that compared to a single-component WO3 film, the Ag-embedded WO3 composite system performed noticeably better electroactively and electrochemically.